SUMITOMO CHEMICAL Inspired by Chemisitry
*
HOME
  Search
  Contact   Site Map   Japanese
About the Company Media Center Investor Information Our Products Business Sectors Procurement R&D Compliance Responsible Care Social Responsibility Careers
comtents
R&D
Research & Development at
Sumitomo Chemical
Our Proprietary Products
Proprietary Manufacturing Processes
Technical Infrastructure
Research Laboratories
Corporate Labs

Latest R&D Reports
Vol. 2010 - II
Vol. 2010 - I
Vol. 2009 - II
Vol. 2009 - I
Vol. 2008 - II
Vol. 2008 - I
Vol. 2007 - II
Vol. 2007 - I
Vol. 2006 - II
Vol. 2006 - I
Vol. 2005 - II
Vol. 2005 - I
Vol. 2004 - II
Vol. 2004 - I
Vol. 2003 - II
Vol. 2003 - I
Vol. 2002 - II
Vol. 2002 - I
Vol. 2001 - II
Vol. 2001 - I
Vol. 2000 - II
Vol. 2000 - I
Vol. 1999 - II
Vol. 1999 - I
Vol. 1998 - II
Vol. 1998 - I
Vol. 1997 - II
Vol. 1997 - I
Vol. 1996 - II
Vol. 1996 - I
Vol. 1995 - II
Vol. 1995 - I
Vol. 1994 - II
Vol. 1994 - I

R&D Data

Plug in


Our Proprietary Products
PHOTO2000/05/25 issue vol. 2000 - I
INDEX
Development of Next Generation Resist (ArF, EB Resist)
The Epitaxial Growth of Compound Semiconductors Using MOCVD
Advanced Cleaning Chemicals for Next Generation Semiconductor Device
High Functionization of Polarizing Films for LCD and Their New Applications
High-performance Color-Filters for Liquid Crystal Displays
Applications Development of Advanced Alumina "Sumicorundum®"
Development of the Heat-resistant and Electrical-conductive Polymer Alloy
Color Reproduction in Soft Copy
The Study of Color Management System for Color Proof
Rotary-Atomizer Type Exhaust Gas Processing Equipment
The Importance of Security and Security Policy in Information Society
Developments and their Applications of Automated Systems for Organic Synthesis
A General Correlation Curve for Dust Cake Filtration in Solid-Liquid Separation
Development of Next Generation Resist (ArF, EB Resist)
Photoresist is the key material for manufacturing LSI (Large Scale Integrated circuit). Because minimum manufacturing dimension of LSI is decided by photoresist resolution. Photoresist resolution mainly depends on exposure wavelength. In the next generation lithography, ArF excimer laser (193nm) will be used for exposure light source. We adopted alicyclic methacrylate resin for 193nm light transmittance and dry-etching resistance.Chemically amplified resist system was used to achieve high sensitivity.We also discuss about development of EB (Electron Bea) resist. Our EB resist is the modification of PVP (Poly-Vinyl Phenol) based KrF resist. Our ArF and EB resist has excellent resolution and profile.
( 4 - 9 by Yasunori UETANI )

   PDF
Top of this page
The Epitaxial Growth of Compound Semiconductors Using MOCVD
GaAs based compound semiconductors have been applied to a variety of electronic devices in the field of telecommunication. It is because GaAs is superior to Si in terms of physical properties such as electron mobility and resistivity, which are important to improve system noise and power efficiency of devices in the wireless communication system. In order to obtain the device performance advantages,in particular, hetero-epitaxy is a key technology right now. In our work,epitaxial layers consisting of several AlGaAs and InGaAs are grown on GaAs substrate by Metal-organic Chemical Vapor Deposition (MOCVD). In the growth of the wafer structure, a lot of ideas have been found and surely improved the device performance. A review on the design technology for hetero-junction field effect transistors in our group will be presented in this paper.
( 10 - 19 by Masahiko HATA, Noboru FUKUHARA, Yuichi SASAJIMA, Yasunari ZEMPO )

   PDF
Top of this page
Advanced Cleaning Chemicals for Next Generation Semiconductor Device
RCA cleaning is widely used to remove contaminants such as particles and metal impurities on a wafer in semiconductor manufacturing. This cleaning is,however, said not to be suitable enough for semiconductor devices of next generation. The great reason is an application of new materials such as Cu, W, and Low-k film, most of which are corroded by the cleaning solution. In this paper, we describe the problems on RCA cleaning from a viewpoint of material corrosion in the application of it to advanced semiconductor devices. Finally, in order to solve this problems, we propose our new type of cleaning chemicals with low corrosion.
( 20 - 28 by Masayuki TAKASHIMA, Naoki ICHIKI )

   PDF
Top of this page
High Functionization of Polarizing Films for LCD and Their New Applications
In recent years, the market of Liquid Crystal Display has been expanded because of the emergence of new applications such as LCD-monitors, LCD-TV, PHS, cellular in addition to the displays for the notebook-type computers. We have been developing new optical materials used for various applications of LCD, putting sheet polarizer technologies as a core science. This paper describes the trends of these fields and the recent developments on sheet polarizers regarding new functions.
( 29 - 36 by Yasuyuki SOMETANI, Nobuyuki KURATA, Kohji HIGASHI, Masaru HONDA,Akiko SHIMIZU, Narutoshi HAYASHI, Makoto NAMIOKA, Kohji MATSUMOTO,Kei-ichi MINAKUCHI, Yutaka KAYANE )

   PDF
Top of this page
High-performance Color-Filters for Liquid Crystal Displays
For the coming society of information technology, it is expected that the market volume of the liquid crystal display (LCD) will be increasing more and more hereafter. The color filter is one of the most important parts for color LCD's . We have been working on the technology development of high performance,high function and cost reduction as a color filter maker. In this paper, regarding the technology of high image performance and large size panel for note PC's, monitors and TV's, we will describe the improvement of color characteristic for high transmittance and high color purity, the development of the resin black matrix for IPS system (one of the wide viewing angle technology) and the pillar type spacer which enables panel makers to control the precise cell gap.
( 37 - 44 by Tsutomu FUJITA, Yukio FUJII, Shigeo HOZUMI, Kouichi SATOU )

   PDF
Top of this page
Applications Development of Advanced Alumina "Sumicorundum®"
"Sumicorundum" has a homogenous shape, superior dispersibility and packing properties. Particle size is able to be controlled from 0.3 µm to 20 µm.These advantages lead "Sumicorundum®" to promising material for sintering and filler applications.
Pore free sinterd body is obtained by using "Sumicorundum®". It has high corrosion resistivity and is suitable to semiconductor manufacturing parts.
Packing ratio to matrix increases by controlling particle size distribution.Therefore thermal conductivity of matrix improved dramatically.Study on application to parts in semiconductor which needs high thermal conductivity is proceeding intensivly.
In this paper we summarize the excellent properties of "Sumicorundum®" for applications in relation to semiconductor field.
( 45 - 49 by Yoshio UCHIDA, Yoshiki KUROTOBI, Hisashi WATANABE, Shinichiro TANAKA )

   PDF
Top of this page
Development of the Heat-resistant and Electrical-conductive Polymer Alloy
The features of the heat-resistant and electrical-conductive polymer alloy ASTEM? are described.
ASTEM? has high heat-resistance and good processability ascribed to polyphenylene ether (PPE) polymer alloy and shows the excellent electrical-conductive feature.
Among the various kinds of impact modifiers investigated, we found that the styrene grafted EPDM showed excellent performances both with the impact strength and the heat resistance. Eventually the superior grade of ASTEM? having the good heat resistance and remarkably high toughness has been developed for the IC tray use.
( 50 - 54 by Takeshi FUJII, Manabu ISHIKAWA )

   PDF
Top of this page
Color Reproduction in Soft Copy
Permanent images on photographs and printings are called hard copy,on the other hand temporary images on displays are called soft copy. According to the recent wide use of computer networks, manipulation of images in multi media becomes widespread. Then new subjects on color reproduction are raised,and are being extensively studied. In this article,the color reproduction concerned with solid state imaging device and soft copy is described at the colorimetric point of view.
( 55 - 62 by Kiyoharu NAKATSUKA )

   PDF
Top of this page
The Study of Color Management System for Color Proof
In the way of transformation of digital color information from in-put devices to out-put ones, Color Management System by using ColorSyncR and ICC Profile has now attracted a considerable attention. However, this management is applied to a few system of Direct Digital Color Proofer (DDCP), which simulate the color of printings, with undesirable color reproduction. This paper describes the design of color chart for ICC Profile which is based on the investigation of the stability of out-put devices as the result of taking up the problem in Color Management System.
( 63 - 72 by Masao KUMIJI, Tomiko SUZUKI )

   PDF
Top of this page
Rotary-Atomizer Type Exhaust Gas Processing Equipment
The rotary-atomizer type exhaust emission processing equipment of SUMITOMO SEIKA CO., LTD. is the wet type exhaust gas processing equipment including a rotary atomizer which has a significant gas-liquid contact efficiency. This is high performance type gas-liquid contact equipment in which the micro and uniform bubbles generated by the high speed rotating rotary atomizer in the absorbing solution,and causes the high level gas-liquid contact efficiency to absorb and remove the harmful gas. The exhaust gas from a semiconductor manufacturing machine has harmful gas. The rotary atomizer type exhaust gas processing equipment continuously removes the harmful gas to a level which is lower than the Threshold Limit Value. Recently, because the exhaust gas from the semiconductor manufacturing process are increasing and diversified, the pipeline to the exhaust gas processing equipment frequently produces problems such as blockage. This blockage problem in pipelines is sometimes the main-cause of reduction in the productivity of semiconductors, and therefore a pipeline system dealing with this problem has also been constructed.
( 73 - 82 by Kenichi MIZOKAWA, Takakazu NAKANISHI, Michitaka HISHIIKE )

   PDF
Top of this page
The Importance of Security and Security Policy in Information Society
I explain the importance of security in information society and what types of security threats. I present recent examples of actual security breaches both inside and outside the company. The first security measure that should be undertaken is to establish a security policy for the enterprise. Each item of security policy is explained,providing high-level and low-level examples. Finally I explain ISO 15408, an international security certification criterion.
( 83 - 92 by Kazuo Yukiura )

   PDF
Top of this page
Developments and their Applications of Automated Systems for Organic Synthesis
Versatile automated systems for organic synthesis have been developed in order to increase the efficiency of chemical experiments and reduce the amount of the chemists' work involved therein. The design concepts required for our systems are "flexible" and "integrated" independent of the developer's tastes. "Flexible" means the use of commercially available softwares and hardwares. "Integrated" means that (1) synthesis and analysis zones are linked in the system,and (2) obtained data should be commonly applied to from laboratory to pilot plant, or even commercial production. Our two types of automated systems based on the same design concept are explained. One is a PC (personal computer)-controlled system with DCS (distributed control system) functions,which manipulates 50 to 100 inputs and outputs in both analog and digital quantities.The software of FIX/DMACS? was used for its SCADA (supervisory control and data acquisition) system. Another system is a robotic workstation for optimization of reaction conditions, which can perform 16 different reactions simultaneously. The range of reaction temperature is from -30 to 160 C. Typical reactions executed by our robotic system range from oximation, N-t-Butoxycarbonylation, alkylation,and cyanation to Grignard reactions. The related topics including the algorithm of reaction optimization,combinatorial chemistry, and microreactors are also discussed.
( 93 - 104 by Hideho OKAMOTO, Atukazu IWATA )

   PDF
Top of this page
A General Correlation Curve for Dust Cake Filtration in Solid-Liquid Separation
The permeability of dust cakes on a filter in solid- liquid separation was studied theoretically and experimentally. The study investigated in particular the effects of particle polydispersity and shape factor on the permeability. In the experimental study, water permeability tests were carried out on six different types of powders including monodisperse spheres and various polydisperse non-spherical particles. Using the parameters derived from a theory that took into account the effects of the particle polydispersity and particle shape, all the collected data were found to correlate well with the dust cake porosity ranging from 0.3 to 0.7. The results suggest that the well-known Kozeny-Carman equation is not applicable to fluid permeation through particle layers having wide powder size distributions or irregular shape. With the proposed correlation, the permeation resistance of liquid across powder layers consisting of non-spherical and polydisperse particles can be quantified. The correlation is useful for the design of filtration devices for colloidal suspensions.
( 105 - 109 by Yoshiyuki ENDO, Tadahiko KINBOSHI )

   PDF
Top of this page


SUMITOMO CHEMICAL @Copyright 2004 Sumitomo Chemical Co.,Ltd,
    Privacy Policy Disclaimer