Sumitomo Chemical to Establish New Technology Center for Photoresists for Advanced Semiconductors at Its Osaka Works

Apr. 9, 2026

Integrating Manufacturing Process Technology Management, Quality Evaluation, and Analytical Functions to Strengthen Its Photoresist Supply System

Sumitomo Chemical has decided to construct a new facility that integrates photoresist manufacturing process technology management, quality evaluation, and analytical functions at its Osaka Works, located in Konohana-ku, Osaka, in order to further strengthen its supply system for photoresists for advanced semiconductors, including extreme ultraviolet (EUV) and argon fluoride (ArF) photoresists. The Company plans to complete the construction of this facility by the end of fiscal 2027.

Photoresists are photosensitive resins used in the semiconductor manufacturing process to form circuit patterns. They are essential materials that support the miniaturization and multilayering of advanced logic and memory semiconductors. Demand for higher performance, higher quality photoresists and their stable supply is expected to continue to rise, driven by the widespread use of generative AI, the advancement of IoT, and expanding investment in data centers. Sumitomo Chemical has expanded its advanced semiconductor photoresist business by building on the organic synthesis technologies it has cultivated through its fine chemicals business and leveraging its world-class technological capabilities.

In 2022, Sumitomo Chemical built new development and evaluation facilities for photoresists at its Osaka Works, where it has, in phases, brought in advanced exposure equipment used to manufacture semiconductors to strengthen its development capabilities from material design through evaluation. To translate what is achieved in the development process into reliable product supply, more sophisticated process control in manufacturing lines is needed. It also requires a system that can manage each step of the process with high precision, from pre‑qualification of raw materials through shipment of the product. The new facility will integrate functions related to manufacturing process technology management, quality evaluation, and analysis for EUV and ArF photoresists, which were previously spread out across Osaka Works, to achieve more advanced process control. The Company will implement this project to expedite the startup of mass production and further stabilize product quality through refined process development, thereby delivering a higher level of product quality and reliability and supply stability. By enhancing the supply system for cutting-edge photoresists to seamlessly handle the whole process from development and mass production to analysis at Osaka Works, Sumitomo Chemical will further strengthen its ability to stably supply products worldwide.

The Sumitomo Chemical Group positions its semiconductor materials business as one of its growths drivers and is focusing resources on actively expanding the business. To date, the Group has steadily invested in its photoresist business, one of the strategic product categories in its semiconductor materials business, through measures such as expanding manufacturing capacity at plants in Japan, constructing new development and evaluation facilities for advanced products, and establishing new manufacturing lines in its facility in South Korea. Sales of EUV and ArF photoresists are expanding steadily, and the Company’s development of next-generation EUV photoresists, including proprietary organic molecular photoresists, is accelerating. Going forward, the Group will continue to work hard to develop new areas of semiconductor materials and contribute to achieving a smart society through the stable supply of high quality products.

Overview of the new facility

Location	3-1-98 Kasugadenaka, Konohana-ku, Osaka, Japan
Scale	Six-story building
Total floor area	Approximately 3,200 m²
Completion	End of fiscal 2027 (planned)

Contact

Sumitomo Chemical Co., Ltd.
Corporate Communications Dept.
https://www.sumitomo-chem.co.jp/english/contact/public/