Sumitomo Chemical pursues even higher performance while offering a rich lineup to cover various exposure processes, ranging from i-line to KrF excimer, ArF excimer, immersion ArF excimer and EUV. As for the i-line photoresist, we provide a wide range of products to address various applications. In the photoresist for EUV and immersion ArF, which is a state-of-the-art process, we supply products that have super high resolution performance with stable quality while responding to the user's development speed in order to contribute to the evolution of semiconductor devices.
In addition, we provide high-performance, high-quality products for new applications. Our thick resists are used in manufacture of three-dimensional flash memories, which is moving toward high integration and large capacity, as well as in the packaging process for semiconductor devices.

Detailed Information on SUMIRESIST™

Inquiries about this product

Product Information

Generic name

Photoresist、Photopolymer

Application

• U0300

Department

Electronic Materials Division No.1 Global Marketing Dept.

Contact

1-98, Kasugade-naka 3-chome, Konohana-ku, Osaka 554-8558, Japan
TEL: +81-6-6466-5086
FAX: +81-6-6466-5347